High temperature X-ray diffraction study of phase decomposition in rapidlyquenched Al-Ge-Si

Citation
N. Mattern et al., High temperature X-ray diffraction study of phase decomposition in rapidlyquenched Al-Ge-Si, POWDER DIFF, 14(2), 1999, pp. 118-121
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
POWDER DIFFRACTION
ISSN journal
08857156 → ACNP
Volume
14
Issue
2
Year of publication
1999
Pages
118 - 121
Database
ISI
SICI code
0885-7156(199906)14:2<118:HTXDSO>2.0.ZU;2-3
Abstract
The phase decomposition occurring during the heating of rapidly quenched Al -Ge-Si allays has been investigated in situ by means of synchrotron radiati on X-ray diffraction. The metastable Al-Ge phases formed in the as-quenched state transform during heating to Al and Ge. The addition of silicon decre ases the transformation temperature. A Ge(Si) solid solution is indicated b y a systematic change in the lattice constant of Ge as a result of the diff usion of Si From the Al matrix into the phase-separated Ge matrix. (C) 1999 International Centre for Diffraction Data. [S0885-7156(98)01404-3].