The resistance of a quasi-ballistic wire fabricated in a high-mobility n-ty
pe Si/SiGe heterostructure is studied as a function of magnetic field in th
e temperature range 0.1 K4.2 K. The wire has a length of 10 mu m and a nomi
nal width of 400 nm. When the magnetic field is increased from 0 T to 10 T
we observe weak localization, reproducible resistance fluctuations and Shub
nikov-de Haas oscillations. The various effects an superimposed on a backgr
ound resistance showing the influence of diffuse sidewall scattering. All t
hese effects are separated and analysed to give a quantitative and consiste
nt picture of the electron transport. The magnitude of the various measured
transport parameters indicates that the electron transport is quasi-ballis
tic. Size effects due to the influence of the confining boundary potential
are observed and accounted fur in the theoretical descriptions.