GaAs AlGaAs buried channel stripe lasers fabricated by a single-stage selective epitaxial growth technique

Citation
Tg. Kim et al., GaAs AlGaAs buried channel stripe lasers fabricated by a single-stage selective epitaxial growth technique, SEMIC SCI T, 14(6), 1999, pp. 570-574
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
14
Issue
6
Year of publication
1999
Pages
570 - 574
Database
ISI
SICI code
0268-1242(199906)14:6<570:GABCSL>2.0.ZU;2-1
Abstract
We report single-stage selective MOCVD grown GaAs/AlGaAs buried channel str ipe lasers with effective optical and current confinement in directions bot h perpendicular and parallel to the p-n junction. Fundamental transverse mo de lasing up to 5 mW/facet, typical threshold current of 60 mA, nearly sing le-longitudinal-mode operation at a wavelength of 890.2 nm at 8 mW and an e xternal differential quantum efficiency of 16%/facet have been achieved for a 250 mu m long cavity under room-temperature CW operation. Maximum output power as high as 16.4 mW is obtained at 400 mA for a 800 mu m long cavity. A tuning rate of the wavelength to temperature is interpolated to be about 0.32 nm degrees C-1 and the characteristic temperature T-0 is measured to be 102 K in thr range of 25 to 65 degrees C for a 500 mu m long cavity.