Influence of dislocations on vertical ordering of Ge islands in Si Ge multilayers grown by low pressure chemical vapour deposition

Citation
G. Capellini et al., Influence of dislocations on vertical ordering of Ge islands in Si Ge multilayers grown by low pressure chemical vapour deposition, SEMIC SCI T, 14(6), 1999, pp. L21-L23
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
14
Issue
6
Year of publication
1999
Pages
L21 - L23
Database
ISI
SICI code
0268-1242(199906)14:6<L21:IODOVO>2.0.ZU;2-G
Abstract
The presence of misfit and threading dislocations formed by strain relaxati on in multilayers of Ge islands grown on Si(100) is investigated by transmi ssion electron microscopy and atomic force microscopy. We find that the dis locations are generated inside the islands and propagate into the silicon s pacers remaining confined within the columnar regions above the islands the mselves. Thus the dislocations drive the vertical ordering of the stacked r elaxed islands in a way similar to the strain induced self-ordering mechani sm in the strained islands.