Nanostructured iron oxide thin films were prepared using a dip-coating tech
nique by forced hydrolysis of a FeCl3, solution with 2% gelatin at 60 degre
es C. The structural properties were characterized by X-ray diffractometer
(XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS
) and UV-Vis absorption measurements. XRD analysis revealed that the iron o
xide in the films consisted of alpha-Fe2O3, AFM showed that the Fe2O3 parti
cles in the films were relatively uniform in size and XPS showed that there
was little carbon on the surface and that the Fe2O3 fully covered the Si s
ubstrate. The particle sizes can be easily controlled through the pH of the
solution. (C) 1999 Elsevier Science B.V. All rights reserved.