Influence of internal diffusion barriers on carbon diffusion in pure titanium and Ti-6Al-4V during diamond deposition

Citation
Mi. De Barros et al., Influence of internal diffusion barriers on carbon diffusion in pure titanium and Ti-6Al-4V during diamond deposition, DIAM RELAT, 8(6), 1999, pp. 1022-1032
Citations number
48
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
8
Issue
6
Year of publication
1999
Pages
1022 - 1032
Database
ISI
SICI code
0925-9635(199906)8:6<1022:IOIDBO>2.0.ZU;2-C
Abstract
Diamond coatings were deposited on pure titanium and Ti-6Al-4V, at a temper ature in the range of 600-750 degrees C, in a microwave plasma from CH4/H-2 and CO/H-2 mixtures. The influence on carbon diffusion of different interm ediate layers, especially tungsten, niobium, titanium nitride and pure tita nium previously deposited on titanium alloys by physical vapor deposition ( PVD) is reported. These intermediate layers are always composed of at least two sub-layers: (1) an internal diffusion barrier and (2) an external tita nium layer that allows some carbon diffusion to be maintained. After diamon d deposition, X-ray diffraction (XRD) analysis and scanning electron micros copy (SEM) observations coupled with energy-dispersive X-ray (EDX) analysis of the final multilayer systems allow us to determine the diffracting phas es, their lattice parameters and the efficiency of the different barriers. The carbon diffusion coefficients in the titanium carbide phase and in the alpha-titanium solid solution are deduced from an experimental study carrie d out on pure titanium with or without an underlying diffusion barrier. The results are compared to the carbon diffusion in Ti-6Al-4V alloy. This work permitted us to calculate the carbon concentration profiles in both pure t itanium and Ti-6Al-4V substrates. (C) 1999 Elsevier Science S.A. All rights reserved.