Charge trapping and defect segregation in quartz

Citation
Mas. Kalceff et al., Charge trapping and defect segregation in quartz, J APPL PHYS, 86(1), 1999, pp. 205-208
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
1
Year of publication
1999
Pages
205 - 208
Database
ISI
SICI code
0021-8979(19990701)86:1<205:CTADSI>2.0.ZU;2-B
Abstract
Irradiation induced charging of wide band gap materials may significantly i nfluence the development of radiation damage and associated defect migratio n. Charge trapped at irradiation induced and/or pre-existing defects induce s a localized electric field within the irradiated volume of specimen. The powerful combination of cathodoluminescence microanalysis and electric forc e microscopy allows direct monitoring of the development of the irradiation induced charge distribution and its effect on the microscopic spatial segr egation of defects. These techniques have been used to demonstrate the impo rtant influence of the induced local field on the microscopic defect struct ure of quartz. (C) 1999 American Institute of Physics. [S0021-8979(99)03413 -1].