We study the electronic structure of {Si}(m){SiO2}(n) superlattices (SLs) g
rown along the [001] direction, using tight-binding methods. Detailed atomi
c models of the Si/SiO2 interface are considered. A clear feature of the re
sults is the essentially direct band-gap structure with flat bands along th
e Z Gamma symmetry line of the SL-Brillouin zone which has a blueshifted en
ergy gap due to quantum confinement. The calculated densities of states are
enhanced at the valence and conduction band edges, as compared with silico
n. The optical properties of the SLs are calculated using a parametrization
of the imaginary part of the dielectric function of bulk Si. The strong co
nfinement of the electron-hole pairs in the Si wells and their tendency to
localize at the low-dielectric {SiO2} interfaces due to the mutual Coulomb
attraction lead to strong electrostatic effects. These produce an interplay
of several length scales in determining possible regimes of high radiative
efficiency. Our results have implications for the understanding of the lum
inescence in porous Si and Si-based nanostructures like the amorphous Si/Si
O2 SLs studied recently. (C) 1999 American Institute of Physics. [S0021-897
9(99)07613-6].