Gw. Charache et al., Moss-Burstein and plasma reflection characteristics of heavily doped n-type InxGa1-xAs and InPyAs1-y, J APPL PHYS, 86(1), 1999, pp. 452-458
Degenerately doped (> 10(19) cm(-3)) n-type InxGa1-xAs (x similar to 0.67)
and InPyAs1-y (y similar to 0.65) possess a number of intriguing electrical
and optical properties relevant to electro-optic devices and thermophotovo
ltaic devices in particular. Due to the low electron effective mass of thes
e materials (m*< 0.2) and the demonstrated ability to incorporate n-type do
pants into the high 10(19) cm(-3) range, both the Moss-Burstein band gap sh
ift and plasma reflection characteristics are particularly dramatic. For In
GaAs films with a nominal undoped band gap of 0.6 eV and N=5x10(19) cm(-3),
the fundamental absorption edge increased to 1.27 eV. InPAs films exhibit
a shorter plasma wavelength (lambda(p)similar to 5 mu m) in comparison to I
nGaAs films (lambda(p)similar to 6 mu m) with similar doping concentrations
. The behavior of the plasma wavelength and the fundamental absorption edge
are investigated in terms of conduction band nonparabolicity and Gamma-L v
alley separation using detailed band structure measurements and calculation
s. (C) 1999 American Institute of Physics. [S0021-8979(99)01612-6].