Moss-Burstein and plasma reflection characteristics of heavily doped n-type InxGa1-xAs and InPyAs1-y

Citation
Gw. Charache et al., Moss-Burstein and plasma reflection characteristics of heavily doped n-type InxGa1-xAs and InPyAs1-y, J APPL PHYS, 86(1), 1999, pp. 452-458
Citations number
42
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
1
Year of publication
1999
Pages
452 - 458
Database
ISI
SICI code
0021-8979(19990701)86:1<452:MAPRCO>2.0.ZU;2-M
Abstract
Degenerately doped (> 10(19) cm(-3)) n-type InxGa1-xAs (x similar to 0.67) and InPyAs1-y (y similar to 0.65) possess a number of intriguing electrical and optical properties relevant to electro-optic devices and thermophotovo ltaic devices in particular. Due to the low electron effective mass of thes e materials (m*< 0.2) and the demonstrated ability to incorporate n-type do pants into the high 10(19) cm(-3) range, both the Moss-Burstein band gap sh ift and plasma reflection characteristics are particularly dramatic. For In GaAs films with a nominal undoped band gap of 0.6 eV and N=5x10(19) cm(-3), the fundamental absorption edge increased to 1.27 eV. InPAs films exhibit a shorter plasma wavelength (lambda(p)similar to 5 mu m) in comparison to I nGaAs films (lambda(p)similar to 6 mu m) with similar doping concentrations . The behavior of the plasma wavelength and the fundamental absorption edge are investigated in terms of conduction band nonparabolicity and Gamma-L v alley separation using detailed band structure measurements and calculation s. (C) 1999 American Institute of Physics. [S0021-8979(99)01612-6].