M. Schweizer et al., Measurement of temperature fluctuations and microscopic growth rates in a silicon floating zone under microgravity, J CRYST GR, 203(4), 1999, pp. 500-510
A silicon crystal growth experiment has been accomplished using the floatin
g-zone technique under microgravity on a sounding rocket (TEXUS 36). Measur
ements of temperature fluctuations in the silicon melt zone due to time-dep
endent thermocapillary convection (Marangoni convection) and an observation
of the microscopic growth rate were simultaneously performed during the ex
periment. Temperature fluctuations of about 0.5-0.7 degrees C with a freque
ncy range <0.5 Hz were detectable. The microscopic growth rate fluctuates c
onsiderably around the average growth rate of I mm/min: Growth rates up to
3-4 mm/min, close to zero mm/min, as well as negative values (backmelting)
were observed. Dopant striations are clearly visible in the Sb-doped crysta
l. They were characterized by spreading resistance measurements and differe
ntial interference contrast microscopy. The frequencies of temperature fluc
tuations, microscopic growth rates, and the dopant inhomogeneities correspo
nd quite well, with main frequencies between 0.1 sind 0.3 Wt. 3D numerical
simulations were performed to predict the optimum position of the temperatu
re sensor, and the characteristic temperature amplitudes and frequencies. A
t a position 3.4 mm above the interface and 1.4 mm inside the melt, equival
ent to the sensor tip position in the experiment, temperature fluctuations
up to 1.8 degrees C and frequencies less than or equal to 0.25 Hz were foun
d in the simulations. (C) 1999 Elsevier Science B.V. All rights reserved.