Ultrahigh-spatial-resolution photoelectron projection microscopy using femtosecond lasers

Citation
Sk. Sekatskii et al., Ultrahigh-spatial-resolution photoelectron projection microscopy using femtosecond lasers, J EXP TH PH, 88(5), 1999, pp. 921-925
Citations number
19
Categorie Soggetti
Physics
Journal title
JOURNAL OF EXPERIMENTAL AND THEORETICAL PHYSICS
ISSN journal
10637761 → ACNP
Volume
88
Issue
5
Year of publication
1999
Pages
921 - 925
Database
ISI
SICI code
1063-7761(199905)88:5<921:UPPMUF>2.0.ZU;2-6
Abstract
Ultrahigh spatial resolution of two-photon photoelectron images (as high as 3 nm, which is the best value that has been achieved to date in photoelect ron microscopy with spatial resolution) is obtained when silicon nanotips a re irradiated by the second harmonic of a pulsed femtosecond Ti : sapphire laser. In addition, the absolute value of the two-photon external photoeffe ct coefficient is measured. (C) 1999 American Institute of Physics. [S1063- 7761(99)01105-1].