Molecular beam epitaxy of periodic BaF2/PbEuSe layers on Si(111)

Citation
Xm. Fang et al., Molecular beam epitaxy of periodic BaF2/PbEuSe layers on Si(111), J VAC SCI B, 17(3), 1999, pp. 1297-1300
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
3
Year of publication
1999
Pages
1297 - 1300
Database
ISI
SICI code
1071-1023(199905/06)17:3<1297:MBEOPB>2.0.ZU;2-K
Abstract
Bragg reflector structures consisting of BaF2/PbEuSe stacks have been epita xially grown on CaF2/Si (111) substrates, The reflectors are centered at a wavelength of 4.0 mu m with a bandwidth of about 3.0 mu m. Reflectivity as high as 95% at the center wavelength has been achieved in three-stack refle ctors. Cracks were visible under an optical Normarski microscope in two-sta ck reflectors, The formation of cracks is probably due to the accumulation of the residual thermal strain in thick layers or the hindrance of dislocat ion glide at the BaF2/PbEuSe interfaces. (C) 1999 American Vacuum Society. [S0734-211X(99)06203-4].