The initial stage of electron field emission from CVD diamond implanted with nitrogen

Authors
Shao, LX Xie, EQ He, DY Chen, GH
Citation
Lx. Shao et al., The initial stage of electron field emission from CVD diamond implanted with nitrogen, MAT SCI E B, 60(2), 1999, pp. 83-87
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
60
Issue
2
Year of publication
1999
Pages
83 - 87
Database
ISI
SICI code
0921-5107(19990615)60:2<83:TISOEF>2.0.ZU;2-8
Abstract
Electron field emission characteristics from chemical vapor deposition (CVD ) diamond thin films implanted with nitrogen have been investigated. It is shown that the formation of a stable emission from these films is character ized by a three-stage process of breakdown of the implanted layer, activati on of the emitter and turn-on of the stable emission. On the basis of the e xperiment results, a modified activation model has been suggested to analyz e the mechanisms of the emission. (C) 1999 Elsevier Science S.A. All rights reserved.