The reaction of H atoms with SiCl4 was studied behind reflected shock
waves at temperatures between 1530 K and 1730 K and pressures around 1
.5 bar by applying atomic resonance absorption spectroscopy (ARAS) for
time resolved measurements of H atoms at the L-alpha-line. The therma
l decomposition of a few ppm ethyl iodide (C2H5I) was used as a H-atom
source. in the presence of a high excess of the molecular reactant Si
Cl4 a slow consumption of H was observed, which follows a pseudo-first
-order rate law. Rate coefficient for the consumption of H by the reac
tion: (RI) H + SiCl4 -->(k1) SiCl3 + HCl was determined to be: k(1) =
1.4 x 10(13) exp(-4800 K/T) cm(3) mol(-1) s(-1). (C) 1997 John Wiley &
Sons, Inc.