X-RAY NONSPECULAR SCATTERING FROM AMORPHOUS MO FILMS

Authors
MA HJ JIANG XM CUI MQ XIAN DC
Citation
Hj. Ma et al., X-RAY NONSPECULAR SCATTERING FROM AMORPHOUS MO FILMS, Chinese Physics Letters, 14(3), 1997, pp. 190-193
Citations number
11
Categorie Soggetti
Physics
Journal title
Chinese Physics Letters → ACNP
ISSN journal
0256307X
Volume
14
Issue
3
Year of publication
1997
Pages
190 - 193
Database
ISI
SICI code
0256-307X(1997)14:3<190:XNSFAM>2.0.ZU;2-X
Abstract
X-ray nonspecular scattering method is used to study the structures of Mo thin films fabricated with magnetron sputtering under different Ar pressures, The results show that with the increase of Ar pressure, th e density of amorphous Mo film decreased; the surface roughness of the films increased, while the surface coherent length decreased. The abn ormal glow discharging in the sputtering processes interprets the obse rved results well.