Na. Sobolev et al., Influence of the orientation of the silicon substrate on the properties ofavalanche Si : Er : O light-emitting structures, SEMICONDUCT, 33(6), 1999, pp. 613-615
The influence of the orientation of silicon on the structural and luminesce
nce properties of avalanche light-emitting diodes fabricated by the coimpla
ntation of erbium and oxygen followed by solid-phase epitaxial (SPE) crysta
llization of the amorphized layer is considered. The luminescence propertie
s are a consequence of the formation of various structural defects during t
he SPE crystallization: V-shaped dislocations and erbium precipitates form
in (100) Si:Er:O layers, and larger structural defects, i.e, twins, are obs
erved in (111) Si:Er:O layers along with an increase in the dislocation den
sity by more than four orders of magnitude in comparison with the (100) ori
entation. The luminescence properties of avalanche and tunnel light-emittin
g diodes are also compared. In contrast to tunnel diodes, in avalanche diod
es erbium ions are excited in the entire space-charge layer, and the effect
ive excitation cross section of the Er3+ ions and their lifetime in the exc
ited state are 3-4 times larger. (C) 1999 American Institute of Physics. [S
1063-7826(99)00706-1].