Atomic-level detection by X-ray microanalysis in the analytical electron microscope

Citation
M. Watanabe et Db. Williams, Atomic-level detection by X-ray microanalysis in the analytical electron microscope, ULTRAMICROS, 78(1-4), 1999, pp. 89-101
Citations number
27
Categorie Soggetti
Multidisciplinary,"Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ULTRAMICROSCOPY
ISSN journal
03043991 → ACNP
Volume
78
Issue
1-4
Year of publication
1999
Pages
89 - 101
Database
ISI
SICI code
0304-3991(199906)78:1-4<89:ADBXMI>2.0.ZU;2-H
Abstract
Experimental measurements and calculations have demonstrated the detecton o f 2 atoms, and the feasibility of detecting single atoms, in the analysis v olume of thin specimens using X-ray energy-dispersive spectrometry (XEDS). The use of a 300 kV VG HB 603 held-emission gun analytical electron microsc ope, with the highest possible X-ray collection efficiency is required. Exp eriments with the only available thin-film standard (NIST standard referenc e material 2063) indicate that, even when seeking relatively high atomic nu mber elements in a low atomic number matrix, specimen thickness (101 nm in this case) limits attempts to detect single atoms. Comparison of simulated and experimental spectra confirm the need for thin ( similar to 10 nm) spec imens and the validity of the Goldstein-Romig-Michael equation defining the detection limit. Using 10 nm foils of homogenized Cu-0.12 wt% Mn alloys it is shown that detection limits of 2 Mn atoms can be achieved with a 99% co nfidence limit. The principal instrumental factor that controls the detecti on limit is the XEDS detector count rate rather than the detector resolutio n. (C) 1999 Published by Elsevier Science B.V. All rights reserved.