Negative photoconductivity in SiO2 films containing Si nanocrystals

Citation
Sh. Choi et Rg. Elliman, Negative photoconductivity in SiO2 films containing Si nanocrystals, APPL PHYS L, 74(26), 1999, pp. 3987-3989
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
26
Year of publication
1999
Pages
3987 - 3989
Database
ISI
SICI code
0003-6951(19990628)74:26<3987:NPISFC>2.0.ZU;2-2
Abstract
Negative photoconductivity is reported in metal-insulator-semiconductor str uctures containing Si nanocrystals produced by ion implantation and anneali ng. Under forward bias, the current is reduced when the sample is illuminat ed with ultraviolet light whilst under reverse bias it is increased. No suc h change is observed in structures that have not been ion implanted. This e ffect is explained by charging of nanocrystals in the oxide layer by photoi onization of electrons. The positively charged nanocrystals screen the appl ied bias voltage leading to a reduction in current at a given voltage. This effect, if larger than the current increase caused by the photoexcitation of carriers in the accumulation layer, gives rise to the observed negative photoconductivity. (C) 1999 American Institute of Physics. [S0003-6951(99)0 1526-0].