Jw. Lim et al., Investigation of the properties of Pd/Ge/Au/Pd/Au ohmic contacts to n-GaAsformed with different ambients, APPL SURF S, 148(1-2), 1999, pp. 34-41
We investigate the effects of different ambients during alloying on the ele
ctrical resistance of electron-beam-evaporated Pd/Ge/Au/Pd/Au contacts to n
-GaAs. For an H-2/N-2 ambient, the lowest contact resistivity of 2.1 x 10(-
6) Ohm cm(2) was obtained after annealing at 400 degrees C for 15 s. For an
N-2 ambient the lowest contact resistivity of 2.2 x 10(-6) Ohm cm(2) was o
btained after annealing at 400 degrees C for 45 s. X-ray diffraction, cross
-sectional scanning electron microscopy, and Auger electron spectroscopy we
re utilized in this study. We found that the formation of AuGa and Pd5Ga2 c
ompounds is responsible for the observed low contact resistivity. (C) 1999
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