Patterned surfaces via self-assembly

The self-assembly of block copolymers, homopolymers and surfactants on surf aces often leads to well-defined patterns with topologically or chemically distinct regions. Important recent developments in controlling the nature o f the pattern include methods to produce patterns via passive adsorption of a solid substrate; coupling of substrate topology and polymer phase separa tion in order to effect control over pattern formation; and methods to 'tun e' the surface potential of the substrate to eventually control pattern for mation. The use of the polymer-patterned surface as a nanolithography mask has also been demonstrated in two very interesting systems.