DC model for BiMOS structure and its adaptation to a circuit simulation environment

Citation
Ss. Rofail et al., DC model for BiMOS structure and its adaptation to a circuit simulation environment, IEE P-CIRC, 146(2), 1999, pp. 83-89
Citations number
17
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS
ISSN journal
13502409 → ACNP
Volume
146
Issue
2
Year of publication
1999
Pages
83 - 89
Database
ISI
SICI code
1350-2409(199904)146:2<83:DMFBSA>2.0.ZU;2-4
Abstract
The objective was to develop a model that can accurately describe the hybri d-mode operation of deep submicron LDD pMOSFETs in a circuit simulation env ironment. The device threshold voltage, various current components, transco nductance, and output conductance are extracted experimentally, modelled an alytically, and adapted to meet the circuit simulation requirements. The la tter necessitates that the model equations, together with their derivatives , be continuous. The effects of independently biasing the source, drain, ga te, and body potentials on the device currents and parameters are highlight ed. A critical comparison between the presented model XSIM and HSPICE is ma de. The results show that unlike HSPICE, where the MOSFET and the bipolar d evice embedded in the structure have to be simulated as two entities, the s uggested model describes the composite structure as a single entity and pre dicts its behaviour accurately for a range of different channel lengths bas ed on a single set of process and device model parameters.