400-mW single-frequency 660-nm semiconductor laser

Citation
B. Pezeshki et al., 400-mW single-frequency 660-nm semiconductor laser, IEEE PHOTON, 11(7), 1999, pp. 791-793
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE PHOTONICS TECHNOLOGY LETTERS
ISSN journal
10411135 → ACNP
Volume
11
Issue
7
Year of publication
1999
Pages
791 - 793
Database
ISI
SICI code
1041-1135(199907)11:7<791:4S6SL>2.0.ZU;2-K
Abstract
Using an angled-grating broad-area structure in GaInP-AlInP material system , we obtain single spatial and longitudinal-mode operation at 660 nm, The g rating stabilizes the mode to deliver over 400-mW continuous-wave at room t emperature from a 60-mu m-wide stripe. This is about ten times higher than conventional distributed-feedback power output levels, and is the highest s ingle-frequency power from a monolithic semiconductor de,ice in this wavele ngth range. These devices should be useful for single-mode-fiber coupling a nd in applications where high-wavelength stability is required, such as spe ctroscopy, interferometry, or metrology.