Comparison of the surface chemical reactivity of hafnium diboride and hafnium

Citation
M. Belyansky et M. Trenary, Comparison of the surface chemical reactivity of hafnium diboride and hafnium, INORG CHIM, 289(1-2), 1999, pp. 191-197
Citations number
42
Categorie Soggetti
Inorganic & Nuclear Chemistry
Journal title
INORGANICA CHIMICA ACTA
ISSN journal
00201693 → ACNP
Volume
289
Issue
1-2
Year of publication
1999
Pages
191 - 197
Database
ISI
SICI code
0020-1693(19990615)289:1-2<191:COTSCR>2.0.ZU;2-F
Abstract
The surface chemistry of the Hf terminated hafnium diboride surface is comp ared with the surface chemistry of I-If metal. The HfB2 surface was prepare d by growing an epitaxial film of HfB2 on top of a Hf(0001) single crystal substrate. Previous experiments demonstrated that the epitaxial film has th e same surface properties as a HfB2(0001) single crystal. The reactivity of the Hf and HfB2 surfaces toward carbon monoxide, diborane, and 1,2-dicarba -closo-dodecaborane were studied with X-ray photoelectron spectroscopy and reflection absorption IR spectroscopy. It was found that the two surfaces d isplay distinctly different surface chemical properties. (C) 1999 Elsevier Science S.A. All rights reserved.