Electrodeposition of Co plus Ni alloys on modified silicon substrates

Cobalt + nickel alloys were electrodeposited on different base-silicon subs trates since these alloys are interesting for several magnetic device appli cations. Acid chloride baths were used to obtain magnetic cobalt + nickel l ayers directly over silicon surfaces, tantalum silicide or metallic seed-la yers. Although the initial stages of nucleation were influenced by the kind of substrate, in all substrates nucleation and three-dimensional growth ev olving to compact, fine-grained and homogeneous deposition, took place. Pre ferential deposition of cobalt and anomalous codeposition occurred. Differe nt compositions of the alloy were obtained, as is normal with a solid-solut ion formation. The cobalt content in the deposit rose with increase in both cobalt(II) and saccharin concentrations and fell with decrease in the appl ied potential or current density.