A statistical analysis of the electrodeposition of nickel in the presence of a magnetic field

Authors
Shannon, JC Gu, ZH Fahidy, TZ
Citation
Jc. Shannon et al., A statistical analysis of the electrodeposition of nickel in the presence of a magnetic field, J APPL ELEC, 29(5), 1999, pp. 577-584
Citations number
17
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF APPLIED ELECTROCHEMISTRY
ISSN journal
0021891X → ACNP
Volume
29
Issue
5
Year of publication
1999
Pages
577 - 584
Database
ISI
SICI code
0021-891X(199905)29:5<577:ASAOTE>2.0.ZU;2-J
Abstract
Statistical analysis has been applied to study the effect of magnetic field s on the electrodeposition of nickel in terms of (i) fractional Brownian th eory applied to its rate, and (ii) a variance-based analysis of the deposit surface roughness determined by confocal scanning laser beam microscopy.