Low temperature thermal annealing effects in bulk and epitaxial CdxHg1-xTe

Citation
P. Capper et al., Low temperature thermal annealing effects in bulk and epitaxial CdxHg1-xTe, J ELEC MAT, 28(6), 1999, pp. 637-648
Citations number
58
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTRONIC MATERIALS
ISSN journal
03615235 → ACNP
Volume
28
Issue
6
Year of publication
1999
Pages
637 - 648
Database
ISI
SICI code
0361-5235(199906)28:6<637:LTTAEI>2.0.ZU;2-R
Abstract
Low temperature thermal treatments of CdHgTe, normally in the presence of m ercury vapor, are still used on both bulk samples and single and multi-laye r epitaxial layers to modify or control the electrical properties. This pap er reviews the recent literature reports in this area and develops the exis ting model to explain certain features of the p to n conversion process. A brief update on compositional interdiffusion at low temperatures is given w hich shows significant disagreement within literature values. In addition, the paper will describe and comment on some as yet unexplained results (int erdiffusion and electrical behavior) following low temperature treatments i n both liquid phase and metalorganic vapor phase epitaxial (LPE and MOVPE) layers.