Initial evaluation of a valved Te source for MBE growth of HgCdTe

Citation
Dd. Edwall et al., Initial evaluation of a valved Te source for MBE growth of HgCdTe, J ELEC MAT, 28(6), 1999, pp. 740-742
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTRONIC MATERIALS
ISSN journal
03615235 → ACNP
Volume
28
Issue
6
Year of publication
1999
Pages
740 - 742
Database
ISI
SICI code
0361-5235(199906)28:6<740:IEOAVT>2.0.ZU;2-X
Abstract
Initial results using a valved Te source for molecular beam epitaxial growt h of Hg1-xCdxTe are described. Unlike the case for a conventional Knudsen e ffusion cell where the flux is controlled primarily by temperature, flux fr om the valved source is controlled primarily by a variable orifice capable of good closure so that the cell temperature can be fixed at the operating temperature. Operating characteristics of the source are described, and inc lude being able to nearly instantaneously change the flux magnitude at will . Using the source for HgCdTe growth has resulted in promising composition reproducibility improvement in initial growth runs.