Citation
Vv. Polonski et al., Nanometric patterning of zinc by optical near-field photochemical vapour deposition, J MICROSC O, 194, 1999, pp. 545-551
Citations number
13
Categorie Soggetti
Multidisciplinary
Journal title
JOURNAL OF MICROSCOPY-OXFORD
ISSN journal
00222720
→ ACNP
Volume
194
Year of publication
1999
Part
2-3
Pages
545 - 551
Database
ISI
SICI code
0022-2720(199905/06)194:<545:NPOZBO>2.0.ZU;2-D
Abstract
A new technique, optical near-field photochemical vapour deposition (NFO-PC
VD) enables maskless production of nanometric structures with controllable
size, chemical composition and morphology By placing a near-field optical m
icroscope inside the reaction chamber for photochemical vapour deposition w
e have deposited nanoscale metal patterns, We demonstrate for the first tim
e, successfully deposited in the near-field region, lines of metallic zinc
with the observed stripe width of 20 nm.