Conversion efficiency or alkoxide precursor to oxide films grown by an ultrasonic-assisted, pulsed liquid injection, metalorganic chemical vapor deposition (pulsed-CVD) process

Citation
S. Krumdieck et R. Raj, Conversion efficiency or alkoxide precursor to oxide films grown by an ultrasonic-assisted, pulsed liquid injection, metalorganic chemical vapor deposition (pulsed-CVD) process, J AM CERAM, 82(6), 1999, pp. 1605-1607
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
ISSN journal
00027820 → ACNP
Volume
82
Issue
6
Year of publication
1999
Pages
1605 - 1607
Database
ISI
SICI code
0002-7820(199906)82:6<1605:CEOAPT>2.0.ZU;2-4
Abstract
Polycrystalline coatings of an oxide, with a columnar grain morphology, wer e grown on metal substrates from metalorganic precursors using the pulsed-C VD process, In a model study, films of the rutile phase of titanium dioxide were grown on nickel by thermal decomposition of titanium isopropoxide. Gr owth rates of up to 0.3 mu m/min were obtained with conversion efficiencies (mole oxide per mole precursor) approaching 100%, The high growth rates an d conversion efficiencies portend the application of this method for the ma nufacture of films and coatings on large surface areas, as, for example, re quired in the deposition of zirconium dioxide on nickel-based superalloys t o serve as thermal barrier coatings on turbine blades.