Conversion efficiency or alkoxide precursor to oxide films grown by an ultrasonic-assisted, pulsed liquid injection, metalorganic chemical vapor deposition (pulsed-CVD) process
S. Krumdieck et R. Raj, Conversion efficiency or alkoxide precursor to oxide films grown by an ultrasonic-assisted, pulsed liquid injection, metalorganic chemical vapor deposition (pulsed-CVD) process, J AM CERAM, 82(6), 1999, pp. 1605-1607
Polycrystalline coatings of an oxide, with a columnar grain morphology, wer
e grown on metal substrates from metalorganic precursors using the pulsed-C
VD process, In a model study, films of the rutile phase of titanium dioxide
were grown on nickel by thermal decomposition of titanium isopropoxide. Gr
owth rates of up to 0.3 mu m/min were obtained with conversion efficiencies
(mole oxide per mole precursor) approaching 100%, The high growth rates an
d conversion efficiencies portend the application of this method for the ma
nufacture of films and coatings on large surface areas, as, for example, re
quired in the deposition of zirconium dioxide on nickel-based superalloys t
o serve as thermal barrier coatings on turbine blades.