CMOS device fabrication and the evolution of optical lithographic exposuretools

Authors
Citation
Wh. Arnold, CMOS device fabrication and the evolution of optical lithographic exposuretools, MICROEL ENG, 46(1-4), 1999, pp. 7-9
Citations number
7
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
46
Issue
1-4
Year of publication
1999
Pages
7 - 9
Database
ISI
SICI code
0167-9317(199905)46:1-4<7:CDFATE>2.0.ZU;2-I