Resonant tunnelling effect in delta doped p-n GaAs junction

Citation
Sa. Vitusevich et al., Resonant tunnelling effect in delta doped p-n GaAs junction, MICROEL ENG, 46(1-4), 1999, pp. 169-172
Citations number
9
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
46
Issue
1-4
Year of publication
1999
Pages
169 - 172
Database
ISI
SICI code
0167-9317(199905)46:1-4<169:RTEIDD>2.0.ZU;2-4
Abstract
An additional interband tunnelling peak in delta doped p-n junction is obse rved. The peak appears at voltages that correspond to the alignment of the delta-layer energy level with an energy in the range from quasi-Fermi level to the top of the valence band of the p(+)-region. Our results show that t he voltage position of the additional peak considerably depends on the temp erature, electrical and magnetic fields with higher switching parameters in comparison to the conventional tunnelling peak. Our findings might be usef ul for the design of new microwave and fast digital devices.