For quantifying the performance of electron beam lithography systems, such
as SCALPEL(R), it is desirable to compare experimental measurements directl
y with the simulated performance predicted by CAD tools. For this purpose,
a post-processing software package has been developed, that takes the raw a
berrations data computed by our electron optical column design software, an
d plots current density contours and histograms in the target plane. The ne
w software simulates any type of fabricated pattern, including crosses used
for measuring pattern placement accuracy in an optical metrology tool, and
high-resolution L-patterns used for measuring critical linewidths in a CD
SEM. The method is illustrated for typical simulated patterns.