An object pattern post-processor for validation of electron optical modelling

For quantifying the performance of electron beam lithography systems, such as SCALPEL(R), it is desirable to compare experimental measurements directl y with the simulated performance predicted by CAD tools. For this purpose, a post-processing software package has been developed, that takes the raw a berrations data computed by our electron optical column design software, an d plots current density contours and histograms in the target plane. The ne w software simulates any type of fabricated pattern, including crosses used for measuring pattern placement accuracy in an optical metrology tool, and high-resolution L-patterns used for measuring critical linewidths in a CD SEM. The method is illustrated for typical simulated patterns.