SCALPEL mask-membrane charging

Electrostatic charge generation and accumulation in a:SiNx thin films irrad iated by energetic (100 keV) electrons is investigated and kinetic equation s describing the dynamic process are formulated. It is found that the incid ent electrons, inelastically scattered in the membrane, primarily generate plasmons. The plasmon decay creates electron-hole pairs and secondary elect rons (SE). The escape of the SEs from the target leads to a positive electr ostatic charge accumulation in the membrane. It is shown that SCALPEL(R) ma rk-membrane charging is defined by the balance of the SE escape, hole trapp ing and transport processes.