Fabrication of phase masks, for fiber grating printing, using EBL and CHF3RIE

Authors
Ardito, M Boschis, L Palumbo, R Meneghini, G
Citation
M. Ardito et al., Fabrication of phase masks, for fiber grating printing, using EBL and CHF3RIE, MICROEL ENG, 46(1-4), 1999, pp. 251-254
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
46
Issue
1-4
Year of publication
1999
Pages
251 - 254
Database
ISI
SICI code
0167-9317(199905)46:1-4<251:FOPMFF>2.0.ZU;2-A
Abstract
This paper reports on the fabrication process of phase mask for fiber grati ng printing. The masks are produced by Electron Beam Lithography (EBL) and Reactive Ion Etching (RIE). A special writing strategy is used in order to reduce the stitching errors. RIE with CHF3 will be discussed. Finally morph ological and optical characterization of the phase mask and of the photo in duced fiber grating will be discussed.