Nanoimprint lithography for a large area pattern replication

Authors
Lebib, A Chen, Y Bourneix, J Carcenac, F Cambril, E Couraud, L Launois, H
Citation
A. Lebib et al., Nanoimprint lithography for a large area pattern replication, MICROEL ENG, 46(1-4), 1999, pp. 319-322
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
46
Issue
1-4
Year of publication
1999
Pages
319 - 322
Database
ISI
SICI code
0167-9317(199905)46:1-4<319:NLFALA>2.0.ZU;2-W
Abstract
We report on replication of high resolution patterns over a 4 in, wafer are a by imprint lithography with a commercial hydraulic press and a pair of ho t plates. The experiments confirm that the imprint lithography can be used for large area patterning. As a result, sub-100 nm features were obtained b y the imprint lithography and lift-off with a good uniformity and an accura te pattern placement over the 4 in. wafer area.