Electronic structure of surface compounds formed under thermal annealing of the La graphite interface

Citation
Am. Shikin et al., Electronic structure of surface compounds formed under thermal annealing of the La graphite interface, SURF SCI, 429(1-3), 1999, pp. 287-297
Citations number
31
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
429
Issue
1-3
Year of publication
1999
Pages
287 - 297
Database
ISI
SICI code
0039-6028(19990610)429:1-3<287:ESOSCF>2.0.ZU;2-E
Abstract
Surface compounds grown by step-by-step thermal annealing of the La/graphit e interface in a temperature range from 600 K to 1400 K were studied by ang le-resolved valence-band photoemission (PE), resonant and C 1s core-level P E as well as by C(KW) Auger electron spectroscopy and low-energy electron d iffraction. It was found that annealing of the system at temperatures betwe en 600 K and 1000 K leads to formation of an ordered La carbide phase with non-dispersive valence-band electronic structure. High-temperature annealin g up to 1100-1400 K results in formation of a thin layer of intercalation-l ike compound on top of the carbide phase. Valence-band energy distribution curves taken for this system reveal (i) graphite-like dispersion of electro nic states shifted toward higher binding energies compared with their posit ion in pristine graphite and (ii) a series of carbide-derived features seen through the thin film of intercalation-like compound. C 1s PE spectra meas ured for the high-temperature phase have two-component lineshape in accorda nce with the layered structure of the system. (C) 1999 Elsevier Science B.V . All rights reserved.