The aluminum film is a standard coating material for optics. It yields a hi
gh reflectance over a broad wavelength region, and films can be made suffic
iently smooth for high quality optical applications. However, it suffers fr
om a high sensitivity to hillock formation and severe degradation of its lo
w light scattering properties, already at temperatures of 70-80 degrees C.
In order to raise the temperature for onset of hillock formation we have co
-evaporated a slight amount (3 at.%) of Cu into the Al film. The anti-hillo
cking performance was indeed confirmed by raising this temperature to simil
ar to 130 degrees C. But, we also greatly reduced the surface roughness of
the as-deposited 3600 Angstrom films to the outstanding values of 1-3 Angst
rom rms as measured by the ASTM F 1048-87 total integrated scattering (TIS)
method. This yields very low light scattering films despite their thicknes
s. Also, the specular reflectance was coming out just as high as for a pure
Al film over a wide wavelength range. The enhanced optical performance is
attributed to less light scattering of the co-evaporated him and to the str
engthening effect in the film. (C) 1999 Elsevier Science S.A. All rights re
served.