Enhanced optical performance of aluminum films by copper inclusion

Citation
C. Kylner et L. Mattsson, Enhanced optical performance of aluminum films by copper inclusion, THIN SOL FI, 348(1-2), 1999, pp. 222-226
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
348
Issue
1-2
Year of publication
1999
Pages
222 - 226
Database
ISI
SICI code
0040-6090(19990706)348:1-2<222:EOPOAF>2.0.ZU;2-4
Abstract
The aluminum film is a standard coating material for optics. It yields a hi gh reflectance over a broad wavelength region, and films can be made suffic iently smooth for high quality optical applications. However, it suffers fr om a high sensitivity to hillock formation and severe degradation of its lo w light scattering properties, already at temperatures of 70-80 degrees C. In order to raise the temperature for onset of hillock formation we have co -evaporated a slight amount (3 at.%) of Cu into the Al film. The anti-hillo cking performance was indeed confirmed by raising this temperature to simil ar to 130 degrees C. But, we also greatly reduced the surface roughness of the as-deposited 3600 Angstrom films to the outstanding values of 1-3 Angst rom rms as measured by the ASTM F 1048-87 total integrated scattering (TIS) method. This yields very low light scattering films despite their thicknes s. Also, the specular reflectance was coming out just as high as for a pure Al film over a wide wavelength range. The enhanced optical performance is attributed to less light scattering of the co-evaporated him and to the str engthening effect in the film. (C) 1999 Elsevier Science S.A. All rights re served.