n-InP epitaxial thin layers are exposed to concentrations of a diluted oxid
izing gas: NO2. in the presence of this gas, the resistance measured parall
el to the surface of the InP layer, between ohmic contacts, increases. The
magnitude of its variations depends on several parameters: the operating te
mperature, the thickness and the doping concentration level of the InP laye
r, and the gas concentration. A theoretical model of the action of the gas
is proposed, mixing chemisorption equilibrium and surface field effect. The
experimental results are in agreement with the theoretical predictions. (C
) 1999 Elsevier Science S.A. All rights reserved.