Process-kinetics in facing targets sputtering of multi-component oxide thin films

The kinetics of the processes in facing targets sputtering of multicomponen t oxide films is presented. The novel configuration of the process exhibits an enhanced ionization efficiency. Discharge diagnostics performed using o ptical emission spectroscopy revealed strong dependence of plasma parameter s on process conditions. Numerical simulation based on thermalization and d iffusion of sputtered atoms has been performed to estimate the transport ef ficiency in off-axis mode. Composition, structure and epitaxial quality of YBa2Cu3O7-x films prepared was found to be strongly dependent on atomic flu x ratios (of Cu/Y and Ba/Y) arriving at the substrate, resputtering effect and phase stability of YBa2Cu3O7-x These studies have been shown to be usef ul in understanding the complex processes that occur in sputtering of multi component films. (C) 1999 Elsevier Science S.A. All rights reserved.