Free-standing yttria-stabilized zirconium oxide membranes were fabricated b
y means of two different processes which are compatible with the standard c
omplementary metal oxide semiconductor technology. The membrane is a thin f
ilm suspended on a pyramid-shape hole obtained on a silicon substrate by me
ans of an anisotropic etching. A square membrane with a maximum side dimens
ion of 170 mu m was obtained. (C) 1999 Elsevier Science S.A. All rights res
erved.