Analysis of AC electrical response for radio-frequency sputtered (Ba0.5Sr0.5)TiO3 thin film

Citation
Yp. Wang et Ty. Tseng, Analysis of AC electrical response for radio-frequency sputtered (Ba0.5Sr0.5)TiO3 thin film, THIN SOL FI, 346(1-2), 1999, pp. 269-274
Citations number
33
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
346
Issue
1-2
Year of publication
1999
Pages
269 - 274
Database
ISI
SICI code
0040-6090(19990601)346:1-2<269:AOAERF>2.0.ZU;2-P
Abstract
Through the measurement of dielectric dispersion as a function of frequency (100 Hz less than or equal to f less than or equal to 1 MHz), we investiga ted the trapping dielectric relaxation of r.f.-sputtered (Ba0.5Sr0.5)TiO3 f ilm and proposed an equivalent circuit on the basis of the admittance and c apacitance spectra. Admittance spectral studies in the temperature range of 200-420 K revealed the existence of a trap level. The trap, located at 0.0 5 eV, is envisaged to be responsible for the origin of dielectric relaxatio n and carrier concentration. The equivalent circuit, consisting of a series trapping resistance and capacitance combination in parallel with leakage r esistance and high frequency limit capacitance, is adopted to explain satis factorily the AC response and to identify the contribution of the shallow t rap on the electrical properties of BST thin film. (C) 1999 Elsevier Scienc e S.A. All rights reserved.