Technical methods for the measurement of thermal expansion coefficient of t
hin films are briefly outlined. Two methods and their principles for the me
asurements of thermal expansion coefficients of anodic films, which an base
d on the X-ray diffraction, are introduced. Owing to the anodic films being
composed of amorphous Al2O3 and part crystalline Al2O3, one method was to
use powders of anodic film. The thermal expansion coefficient can be deduce
d by the linear relationship between the lattice spacing of the correspondi
ng diffracted planes of Al2O3 and temperature. The other method is that the
rmal strains in the film were measured by in situ X-ray diffraction with th
e complete sample, i.e. the film and substrate attached together. In additi
on, the difference of values obtained by the above methods was analysed. (C
) 1999 Elsevier Science S.A. All rights reserved.