Two-dimensional spatial distributions of sputtered particles produced in aplanar magnetron discharge of indium-tin-oxide target

Spatial distributions of sputtered particles during the de planar magnetron sputtering of indium-tin-oxide (ITO) target in 5 mTorr Ar/O-2 were measure d by two-dimensional optical emission spectroscopy (2D-OES) and laser induc ed fluorescence spectroscopy (2D-LIF). Absolute number density of sputtered in atoms was determined by calibrating the LIF signal with Rayleigh scatte ring signal from Ar. The flux of atomic species onto the substrate were est imated from the experimental In density and the assumed average velocity of sputtered particles. Comparison between the total flux evaluated from expe rimental deposition rate and the atomic flux estimated above indicated that the flux of molecular species should exist according to the fractional rat io of introduced O-2 to Ar. Spatial inhomogeneity in film properties such a s deposition rate and resistivity and the influence of oxygen partial press ure on them were discussed based on the 2D spatial profiles of sputtered sp ecies. (C) 1999 Elsevier Science S.A. All rights reserved.