A kinetic model for H2O2/UV process in a completely mixed batch reactor

A dynamic kinetic model for the advanced oxidation process (AOP) using hydr ogen per oxide and ultraviolet irradiation (H2O2/UV) in a completely mixed batch reactor (CMBR) is developed. The model includes the known elementary chemical and photochemical reactions, and literature reported photochemical parameters and chemical reaction rate constants are used in this model to predict organic contaminant destruction. Unlike most other kinetic models o f H2O2/UV oxidation process, the model does not assume that the net formati on rare of free radical species is zero (pssudo-steady state assumption). I n addition, the model considers the solution pH decrease during the process as mineral acids and carbon dioxide are formed. The model is tested by pre dictine the destruction of a probe compound, 1,2-dibromo-3-chloropropane (D BCP) in distilled water with the addition of inorganic carbon. The new mode l developed in this work gives better predictions of the destruction of the target organic compound than the model based on the pseudo-steady state as sumption. The model provides a comprehensive understanding of the impact of design and operational variables on process performance, Accordingly the a bility of the model to select optimum process variables, such as hydrogen p eroxide dosage, is illustrated. (C) 1999 Elsevier Science Ltd. All rights r eserved.