Rs. Juang et al., Adsorption removal of copper(II) using chitosan from simulated rinse solutions containing chelating agents, WATER RES, 33(10), 1999, pp. 2403-2409
The adsorption ability of Cu(II) using chitosan from simulated rinse soluti
ons containing chelating agents was studied. Four chelating agents includin
g ethylenediaminetetraacetic acid (EDTA), citric acid, tartaric acid and so
dium gluconate were selected. It was shown that the concentration ratio of
chelating agent to Cu(II) as well as the NaOH concentration significantly a
ffected the adsorption capacity. Competition between coordination of Cu(II)
with unprotonated chitosan and electrostatic interaction of Cu(II) chelate
s with protonated chitosan played an important role in this adsorption syst
em. The maximum adsorption capacity was found within each optimal pH range.
This work provided a simple criteria for adsorption removal of Cu(II) from
such industrial rinse solutions (0.3-5.0 mol/m(3)) using chitosan. (C) 199
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