Thin-films have been deposited onto silicon and metal substrates by plasma
polymerization of vinyltrimethylsilane (VTMS), to provide hydrophobic coati
ngs for dropwise condensation of steam. The deposition conditions have been
sampled by a set of statistically designed experiments, and the films' thi
cknesses, water droplet contact angles, elemental compositions (by XPS), an
d -CHx, contents have been measured. There is a strong correlation between
these film properties and their deposition conditions. The films that conti
nue to provide successful long-term dropwise condensation had been deposite
d at a low rate onto heated substrates, such that they have high water cont
act angle and high -CHx, content. This required a plasma that provided a lo
w electron energy input per precursor species collision.