Fabrication of a thin film phase grating assisted by surface acoustic waves

Citation
Y. Nakagawa et al., Fabrication of a thin film phase grating assisted by surface acoustic waves, ELEC C JP 3, 82(12), 1999, pp. 26-33
Citations number
7
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
ELECTRONICS AND COMMUNICATIONS IN JAPAN PART III-FUNDAMENTAL ELECTRONIC SCIENCE
ISSN journal
10420967 → ACNP
Volume
82
Issue
12
Year of publication
1999
Pages
26 - 33
Database
ISI
SICI code
1042-0967(199912)82:12<26:FOATFP>2.0.ZU;2-Z
Abstract
Nakagawa et al, found in fabricating the Ta2O5 amorphous thin film by sputt ering, that the refractive index and the photoelastic constant of the thin film are emphasized by the "diffused-out" electric field of the surface aco ustic wave and that there, a phase grating is generated in which the thin f ilm thickness, as well as the internal refraction index, vary periodically. This phenomenon is new and very interesting. This study intends to apply t he power of surface acoustic waves. A thin film phase grating is fabricated , the mechanism of generation is analyzed, and engineering applications to optical devices are tested. Large variations of 1.78% at the maximum in the film thickness and 5.9% in the refraction index are obtained. The fabricat ion of a precise two-dimensional grating is easy. (C) 1999 Scripta Technica .