Characteristics of P-channel polysilicon conductivity modulated thin-film transistors

Citation
Cx. Zhu et al., Characteristics of P-channel polysilicon conductivity modulated thin-film transistors, IEEE DEVICE, 46(7), 1999, pp. 1406-1410
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
46
Issue
7
Year of publication
1999
Pages
1406 - 1410
Database
ISI
SICI code
0018-9383(199907)46:7<1406:COPPCM>2.0.ZU;2-E
Abstract
A p-channel polysilicon conductivity modulated thin-film transistor (CMTFT) is demonstrated and experimentally characterized. The transistor uses the concept of conductivity modulation in the offset region to obtain a signifi cant reduction in on-state resistance, The conductivity modulation is achie ved by injecting minority carriers (electrons) into the offset region throu gh a diode added to the drain, Experimental results show that the conductiv ity modulation in the p-channel device is as effective as that in the n-cha nnel device, This structure can provide 1.5 to 2 orders of magnitude higher on-state current than that of the conventional offset drainthin-film trans istor (TFT) at drain voltage ranging from - 15 V to -5 V while still mainta ining low leakage current and simplicity in device operation. The p-channel CMTFT can be combined with the n-channel CMTFT to form CMOS high-voltage d rivers, which is very suitable for use in fully integrated large-area elect ronic applications.