We have studied the effects of inserting Si/Si0.6Ge0.4 strain-balanced supe
rlattices (SLs) into Si0.8Ge0.2 (001) virtual substrates. The SiGe SL layer
thickness chosen was larger than the critical thickness for elastic relaxa
tion and generated numerous hemicylindrical features oriented along the [10
0] directions. These features lead, when covered by Si0.8Ge0.2, to a disrup
tion of the well-ordered surface crosshatch along the [110] directions, and
to a significant lowering of the surface roughness. There is also evidence
for some filtering of the threading dislocations by the SL. (C) 1999 Ameri
can Institute of Physics. [S0021-8979(99)04314-5].