The perpendicular magnetic anisotropy, coercive field, and initial magnetiz
ation curves of amorphous TbxFe1-x (x between 0.15 and 0.32) were measured
at room temperature for samples prepared under a wide variety of preparatio
n conditions, including both e-beam co-evaporation and dc magnetron cosputt
ering. The effect of growth temperature, annealing, and thickness were inve
stigated. The perpendicular magnetic anisotropy shows little dependence on
substrate type, sample thickness, or details of the deposition such as sput
tering or e-beam evaporation, but is strongly dependent on growth temperatu
re, increasing with increasing growth temperature up to nearly 300 degrees
C. Coercivity on the other hand is extremely dependent on microstructure, a
nd hence, on details of preparation, substrate type, and thickness. It is m
uch larger in evaporated films than in similarly prepared dc magnetron sput
tered films. Normalized coercivity decreases monotonically with increasing
growth temperature. The dominant mechanism appears to be domain wall pinnin
g in the bulk of the film due to columnar microstructure. High growth tempe
rature stabilizes the material against subsequent annealing which tends to
eliminate the anisotropy and, more slowly, the coercivity. (C) 1999 America
n Institute of Physics. [S0021-8979(99)08314-0].